Dézauzier, C.: search on Z-Library

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1

Le corps de l’enfant aux prises avec le cancer; The body of the child faced with cancer;

Mallet, J., Martin-Mattera, P., Levy, A., Peretti, P., Roquand, M.-A., Dézauzier, C.

Journal:

Psycho-Oncologie

Year:

2017

Language:

french

File:

PDF, 123 KB

french, 2017

2

Electrical characterization of SiC for high-temperature thermal-sensor applications

C. Dezauzier, N. Becourt, G. Arnaud, S. Contreras, J.L. Ponthenier, J. Camassel, J.L. Robert, J. Pascual, C. Jaussaud

Journal:

Sensors and Actuators A: Physical

Year:

1995

File:

PDF, 381 KB

1995

3

Analysis of transport properties of β-SiC films: determination of donor density and compensation ratio

Contreras, S., Dezauzier, C., Thomas, P., Robert, J.L.

Journal:

Diamond and Related Materials

Year:

1997

Language:

english

File:

PDF, 508 KB

english, 1997

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Scatterometry-based metrology for the 14nm node double patterning lithography

Cain, Jason P., Sanchez, Martha I., Carau, D., Bouyssou, R., Ducoté, J., Dettoni, F., Ostrovsky, A., Le Gratiet, B., Dezauzier, C., Besacier, M., Gourgon, C.

Year:

2015

Language:

english

File:

PDF, 1.27 MB

english, 2015

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Performance of ASML YieldStar μDBO overlay targets for advanced lithography nodes C028 and C014 overlay process control

Blancquaert, Yoann, Dezauzier, Christophe, Depre, Jerome, Miqyass, Mohamed, Beltman, Jan, Starikov, Alexander, Cain, Jason P.

Year:

2013

Language:

english

File:

PDF, 1006 KB

english, 2013

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Diffraction based overlay and image based overlay on production flow for advanced technology node

Blancquaert, Yoann, Dezauzier, Christophe, Starikov, Alexander, Cain, Jason P.

Year:

2013

Language:

english

File:

PDF, 800 KB

english, 2013

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Image based overlay measurement improvements of 28nm FD-SOI CMOS front-end critical steps

Sanchez, Martha I., Ukraintsev, Vladimir A., Dettoni, F., Shapoval, T., Bouyssou, R., Itzkovich, T., Haupt, R., Dezauzier, C.

Year:

2017

Language:

english

File:

PDF, 1.00 MB

english, 2017

8

Flash photolysis studies of the reaction of NH2 radicals with NO

R. Lesclaux, Pham Van Khê, P. Dezauzier, J.C. Soulignac

Journal:

Chemical Physics Letters

Year:

1975

Language:

english

File:

PDF, 443 KB

english, 1975

9

2-NSEC pulses from double cavity dye laser

A. Eranian, P. Dezauzier, O. de Witt

Journal:

Optics Communications

Year:

1973

Language:

english

File:

PDF, 391 KB

english, 1973

10

Structural, optical and electrical properties of state of the art cubic SiC films

J. Stoemenos, C. Dezauzier, G. Arnaud, S. Contreras, J. Camassel, J. Pascual, J.L. Robert

Journal:

Materials Science and Engineering: B

Year:

1995

Language:

english

File:

PDF, 631 KB

english, 1995

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - 3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements

Foucher, J., Rana, N., Dezauzier, C., Raymond, Christopher J.

Year:

2010

Language:

english

File:

PDF, 2.33 MB

english, 2010

12

Amplification competition in a double-cavity flash-pumped dye laser

Dezauzier, Pierre

Journal:

Applied Physics Letters

Year:

1973

Language:

english

File:

PDF, 497 KB

english, 1973

13

Dual Gate Oxide for 0.18μm Technologies and Below: Optimization of the Wet Processing Sequence

Lévy, Didier, Petitdidier, Sébastien, Bernard, H., Guyader, F., Dezauzier, C., Pizzetti, C.

Journal:

Solid State Phenomena

Year:

2001

File:

PDF, 324 KB

2001

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Target design optimization for overlay scatterometry to improve on-product overlay

Cain, Jason P., Sanchez, Martha I., Smilde, Henk-Jan H., van Haren, Richard J. F., van Buël, Willy, Driessen, Lars H. D., Dépré, Jérôme, Beltman, Jan, Dettoni, Florent, Ducoté, Julien, Dezauzier, Chri

Year:

2015

Language:

english

File:

PDF, 688 KB

english, 2015

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - 64nm pitch metal1 double patterning metrology: CD and OVL control by SEMCD, image based overlay and diffraction based overlay

Cain, Jason P., Sanchez, Martha I., Ducoté, Julien, Dettoni, Florent, Bouyssou, Régis, Le-Gratiet, Bertrand, Carau, Damien, Dezauzier, Christophe

Year:

2015

Language:

english

File:

PDF, 2.95 MB

english, 2015

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Data fusion for CD metrology: heterogeneous hybridization of scatterometry, CDSEM, and AFM data

Cain, Jason P., Sanchez, Martha I., Hazart, J., Chesneau, N., Evin, G., Largent, A., Derville, A., Thérèse, R., Bos, S., Bouyssou, R., Dezauzier, C., Foucher, J.

Year:

2014

Language:

english

File:

PDF, 496 KB

english, 2014

17

Optical investigation of quality improvement of 3C-SiC films after sacrificial oxidation process

Arnaud, G., Aisina, F., Pascual, J., Dezauzier, C., Camassel, J., Bécourt, N., Di Ciocca, L.

Journal:

Materials Science and Technology

Year:

1996

Language:

english

File:

PDF, 753 KB

english, 1996

18

SPIE Proceedings [SPIE SPIE Photonics Europe - Brussels, Belgium (Monday 14 April 2014)] Optical Micro- and Nanometrology V - Advanced metrology for the 14 nm node double patterning lithography

Gorecki, Christophe, Asundi, Anand K., Osten, Wolfgang, Carau, D., Bouyssou, R., Dezauzier, C., Besacier, M., Gourgon, C.

Year:

2014

Language:

english

File:

PDF, 969 KB

english, 2014

19

SPIE Proceedings [SPIE SPIE Optical Metrology - Munich, Germany (Monday 23 May 2011)] Modeling Aspects in Optical Metrology III - Alternative robust statistical methods to reduce parameters uncertainty: application to scatterometry

Hazart, J., Bodermann, Bernd, Sarrazy, F., Buyssou, R., Dezauzier, C.

Year:

2011

Language:

english

File:

PDF, 520 KB

english, 2011

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